The dual-layer design of the box provides high-efficiency protection for the transportation and storage of 6-inch EUV reticles between process stations. The inner EIP can be operated in a vacuum environment. Supports purge function to control the temperature and humidity of the micro-environment inside the reticle carrier box
Size
6 x 6 x 0.25 (in.)
Material
PEEK(ESD)、Metal
Usage
Support purge function
Application
Suitable for EUV process (ASML Certification)
Feature
Comply with SEMI specification
Support OHT function
Support RFID function
Dual-layer design: EOP (outer layer) and EIP (inner layer)
EOP uses static dissipative and low outgassing materials
EIP can be operated in a vacuum environment
The contact points with the reticle are all wear-resistant materials: effectively reduce particle generation
Excellent air tightness
Selectable items-EIP form: with pellicle reticle version/without pellicle reticle version
