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EUV POD

EUV POD

EUV POD

The dual-layer design of the box provides high-efficiency protection for the transportation and storage of 6-inch EUV reticles between process stations. The inner EIP can be operated in a vacuum environment. Supports purge function to control the temperature and humidity of the micro-environment inside the reticle carrier box
  • Size
    6 x 6 x 0.25 (in.)
  • Material
    PEEK(ESD)、Metal
  • Usage
    Support purge function
  • Application
    Suitable for EUV process (ASML Certification)
Feature
  • Comply with SEMI specification
  • Support OHT function
  • Support RFID function
  • Dual-layer design: EOP (outer layer) and EIP (inner layer)
  • EOP uses static dissipative and low outgassing materials
  • EIP can be operated in a vacuum environment
  • The contact points with the reticle are all wear-resistant materials: effectively reduce particle generation
  • Excellent air tightness
  • Selectable items-EIP form: with pellicle reticle version/without pellicle reticle version
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